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Description
Different design concepts of channels in boron-doped diamond will be implemented in the modelling process. Simulation by the COMSOL Multiphysics environment and simulation tests of the flow of investigated fluid through BDD microfluidic channel will be carried out. This will make it possible to find the spatial (local) flow through the channel at different Qin and the speed distribution U (x,y) Based on the found speed distribution U (x,y), a simplified model of BDD channel will be created to build a model of an electrochemical microfluidic sensor.
Summary of the results
Different design concepts of channels in boron-doped diamond have been implemented in the modelling process. Simulation by the COMSOL Multiphysics environment and simulation tests of the flow of investigated fluid through BDD microfluidic channel has been carried out. An electrochemical model was built in the COMSOL environment using the Fluid Flow interface and the Electrochemistry module. 4. Modeling of microfluidic channels included examining the shape, dimensions, input conditions, and determining the distribution of velocity and pressure fields. Note that as the channel height decreases, the average current density increases. Therefore, after reducing the channel height from 500 nm to 100 nm, the maximum value of the average current density changed from 2.87 A/m2 to 9.29 A/m2. For selected channeldimensions, the Reynolds number was calculated, which showed that the flow in the channel is laminar. The influence of electrode roughness was also investigated. These studies showed that roughness does not affect laminar flow, but does affect the concentration of reactants. The maximum concentration values were observed at a roughness height of 100 nm. Using the FEM CAE tool, a mathematical model of the microchannels of a laboratory chip sensor was developed and solved, which includes the processes of mass transfer, fluid flow and ion exchange. The 2D model was tested with different values of vertex potential, linear sweep rate, and surface resistance.